摘要
We demonstrate manipulation of quantum interference by controlling the competitions between weak localization (WL) and weak antilocalization (WAL) via variation of the gate voltages of double-gate amorphous InGaZnO thin-film transistors. This letter unveils the full profile of an intriguing universal dependence of the respective WL and WAL contributions on the channel conductivity. This universality is discovered to be robust against interface disorder.
| 原文 | 英語 |
|---|---|
| 文章編號 | 8234569 |
| 頁(從 - 到) | 212-215 |
| 頁數 | 4 |
| 期刊 | IEEE Electron Device Letters |
| 卷 | 39 |
| 發行號 | 2 |
| DOIs | |
| 出版狀態 | 已發佈 - 2018 2月 |
ASJC Scopus subject areas
- 電子、光磁材料
- 電氣與電子工程
指紋
深入研究「Weak Localization and Weak Antilocalization in Double-Gate a-InGaZnO Thin-Film Transistors」主題。共同形成了獨特的指紋。引用此
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