Weak Localization and Weak Antilocalization in Double-Gate a-InGaZnO Thin-Film Transistors

Wei Hsiang Wang, Elica Heredia, Syue Ru Lyu, Shu Hao Liu, Po Yung Liao, Ting Chang Chang, Pei Hsun Jiang*

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

4 引文 斯高帕斯(Scopus)

摘要

We demonstrate manipulation of quantum interference by controlling the competitions between weak localization (WL) and weak antilocalization (WAL) via variation of the gate voltages of double-gate amorphous InGaZnO thin-film transistors. This letter unveils the full profile of an intriguing universal dependence of the respective WL and WAL contributions on the channel conductivity. This universality is discovered to be robust against interface disorder.

原文英語
文章編號8234569
頁(從 - 到)212-215
頁數4
期刊IEEE Electron Device Letters
39
發行號2
DOIs
出版狀態已發佈 - 2018 2月

ASJC Scopus subject areas

  • 電子、光磁材料
  • 電氣與電子工程

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