Use of a high-work-function Ni electrode to improve the stress reliability of analog SrTiO3 metal-insulator-metal capacitors

K. C. Chiang, C. H. Cheng, K. Y. Jhou, H. C. Pan, C. N. Hsiao, C. P. Chou, S. P. McAlister, Albert Chin, H. L. Hwang

研究成果: 雜誌貢獻期刊論文同行評審

33 引文 斯高帕斯(Scopus)

摘要

We have studied the stress reliability of low-energy-bandgap high-κ SrTiO3 metal-insulator-metal capacitors under constant voltage stress. By using a high-work-function Ni electrode (5.1 eV), we reduced the degrading effects of stress on the capacitance variation ( Δ C/C), the quadratic voltage coefficient of capacitance (VCC-α), and the long-term reliability, in contrast with using a TaN. The improved stress reliability for the Ni electrode capacitors is attributed to a reduction of carrier injection and trapping.

原文英語
頁(從 - 到)694-696
頁數3
期刊IEEE Electron Device Letters
28
發行號8
DOIs
出版狀態已發佈 - 2007 八月

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

指紋 深入研究「Use of a high-work-function Ni electrode to improve the stress reliability of analog SrTiO<sub>3</sub> metal-insulator-metal capacitors」主題。共同形成了獨特的指紋。

引用此