Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

K. C. Chiang^*, C. C. Huang, H. C. Pan, C. N. Hsiao, J. W. Lin, I. J. Hsieh, C. H. Cheng, C. P. Chou, A. Chin, H. L. Hwang, S. P. McAlister

^*此作品的通信作者

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審