Thermal leakage improvement by using a high-work-function Ni electrode in high-κ TiHfO metal-insulator-metal capacitors

K. C. Chiang*, C. C. Huang, H. C. Pan, C. N. Hsiao, J. W. Lin, I. J. Hsieh, C. H. Cheng, C. P. Chou, A. Chin, H. L. Hwang, S. P. McAlister

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

25 引文 斯高帕斯(Scopus)

摘要

An unavoidable drawback when using high- κ dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high- κ TiHfO capacitors. This avoids sacrificing the overall κ value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits.

原文英語
頁(從 - 到)G54-G57
期刊Journal of the Electrochemical Society
154
發行號3
DOIs
出版狀態已發佈 - 2007
對外發佈

ASJC Scopus subject areas

  • 電子、光磁材料
  • 可再生能源、永續發展與環境
  • 表面、塗料和薄膜
  • 電化學
  • 材料化學

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