The magnetic reversal study of permalloy micro domains

Y. W. Huang, C. K. Lo, Y. D. Yao, T. R. Jeng, J. J. Ju

研究成果: 書貢獻/報告類型會議論文篇章

摘要

In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.

原文英語
主出版物標題Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)0780376471, 9780780376472
DOIs
出版狀態已發佈 - 2003
對外發佈
事件2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, 美国
持續時間: 2003 3月 302003 4月 3

出版系列

名字Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference

其他

其他2003 IEEE International Magnetics Conference, Intermag 2003
國家/地區美国
城市Boston
期間2003/03/302003/04/03

ASJC Scopus subject areas

  • 工程 (全部)

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