The magnetic reversal study of permalloy micro domains

Y. W. Huang*, C. K. Lo, Y. D. Yao, T. R. Jeng, J. J. Ju

*此作品的通信作者

研究成果: 雜誌貢獻會議論文同行評審

摘要

The analysis of permalloy micro domains using magnetic reversal study was performed. Electron beam lithography was employed to define a sub micron magnetic cell with different shapes. The patterns were transferred onto the substrate by dipping the sample into acetone for the lift-off process. The results showed that the magnetization of cells was different which could be due to the nonuniformity of the current density over the metal line.

原文英語
頁(從 - 到)EP17
期刊Digests of the Intermag Conference
出版狀態已發佈 - 2003
對外發佈
事件Intermag 2003: International Magnetics Conference - Boston, MA, 美国
持續時間: 2003 3月 282003 4月 3

ASJC Scopus subject areas

  • 電氣與電子工程

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