The influence of lanthanum doping position in ultra-thin HfO2 films for high-k gate dielectrics

Chuan-Hsi Liu, P. C. Juan, J. Y. Lin

研究成果: 雜誌貢獻期刊論文同行評審

16 引文 斯高帕斯(Scopus)

指紋 深入研究「The influence of lanthanum doping position in ultra-thin HfO<sub>2</sub> films for high-k gate dielectrics」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy