The Demonstration of 3-D Bi2.0Te2.7Se0.3/Bi0.4Te3.0Sb1.6 Thermoelectric Devices by Ionized Sputter System

M. H. Liao*, K. C. Huang, W. J. Su, S. C. Chen, M. H. Lee


研究成果: 雜誌貢獻期刊論文同行評審

1 引文 斯高帕斯(Scopus)


In this brief, we propose and demonstrate the Bi2.0Te2.7Se0.3/Bi0.4Te3.0Sb1.6 thermoelectric (TE) device with the 3-D structure through the manufacturing process by the ionized sputter system. With the same top-point-of-view area, the proposed 3-D TE device in this brief has approximately twice the number of n-/p-junctions than that in our previously demonstrated 2-D TE device. In order to extract the Seebeck coefficient (S) and the electrical conductivity (σ) to evaluate the total efficiency in our TE device, we also build up the accurate measurement systems. It can be found that the S value is improved ∼25% successfully in our proposed 3-D TE device with the same TE material thickness (t) of 100 nm. On the other hand, the power factor is also found to be enhanced to ∼50% accordingly. In summary, the figure of merit (ZT) - i.e., the ability of a TE device to efficiently produce electricity - is increased to ∼50% and achieves a value of 0.9, which is the highly competitive number at the low operating temperature (T) of 130 °C in our proposed 3-D TE devices in this brief.

頁(從 - 到)406-408
期刊IEEE Transactions on Electron Devices
出版狀態已發佈 - 2020 一月

ASJC Scopus subject areas

  • 電子、光磁材料
  • 電氣與電子工程


深入研究「The Demonstration of 3-D Bi<sub>2.0</sub>Te<sub>2.7</sub>Se<sub>0.3</sub>/Bi<sub>0.4</sub>Te<sub>3.0</sub>Sb<sub>1.6</sub> Thermoelectric Devices by Ionized Sputter System」主題。共同形成了獨特的指紋。