Synthesis and electron field emission properties of nanodiamond films

Y. C. Lee, S. J. Lin, C. T. Chia, H. F. Cheng, I. N. Lin*


研究成果: 雜誌貢獻會議論文同行評審

22 引文 斯高帕斯(Scopus)


Effects of CH4/H2 ratio and bias voltage of the microwave plasma-enhanced chemical vapor deposition (MPE-CVD) process on the nucleation behavior and associated characteristics of nanodiamonds were investigated, While the scanning electron microscopy (SEM) microstructure and Raman crystal structure of the films insignificantly vary with CH 4/H2 ratio and bias voltage, electron field emission properties of the materials markedly change with these deposition parameters. The predominating factor modifying the electron field emission properties of the nanodiamond films is presumed to be the increase in the proportion of sp2-bonded grain boundaries when the grain size of the nanodiamond films decreases. Between these two major factors, the bias voltage shows more prominent effects on modifying the granular structure of the nanodiamonds than the CH4/H2 ratio does. The best electron field emission properties attainable are Je=500 μA/cm2 at 20 V/μm and E0=8.5 V/μm.

頁(從 - 到)2100-2104
期刊Diamond and Related Materials
出版狀態已發佈 - 2004 11月
事件Proceedings of the 9th International Conference on New Diamond - Tokyo, 日本
持續時間: 2004 3月 262004 3月 29

ASJC Scopus subject areas

  • 電子、光磁材料
  • 一般化學
  • 機械工業
  • 材料化學
  • 電氣與電子工程


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