Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

Zhe Chuan Feng; Li Chi Cheng; Chu Wan Huang; Ying Lang Wang; T. R. Yang

doi:10.1109/SMELEC.2006.380785

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

Zhe Chuan Feng^*
, Li Chi Cheng
, Chu Wan Huang
, Ying Lang Wang
, T. R. Yang

^*此作品的通信作者

物理學系

研究成果: 書貢獻/報告類型 › 會議論文篇章

1 引文斯高帕斯（Scopus）

摘要

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy techniques have been employed for the investigation on Si-based layer structures for sub-micron Si-IC Applications. The high energy synchrotron radiation light sources have produced plenty of X-ray lines with high index diffraction and strong X-ray photoelectron emissions. The useful information will increase our understanding of these materials which are applied extensively to the semiconductor industry.

原文	英語
主出版物標題	ICSE 2006
主出版物子標題	2006 IEEE International Conference on Semiconductor Electronics, Proceedings
頁面	981-984
頁數	4
DOIs	https://doi.org/10.1109/SMELEC.2006.380785
出版狀態	已發佈 - 2006
事件	2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006 - Kuala Lumpur, 马来西亚持續時間: 2006 11月 29 → 2006 12月 1

出版系列

名字	IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

會議

會議	2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006
國家/地區	马来西亚
城市	Kuala Lumpur
期間	2006/11/29 → 2006/12/01

ASJC Scopus subject areas

一般工程

存取文件

10.1109/SMELEC.2006.380785

其它文件與鏈接

引用此

Feng, Z. C., Cheng, L. C., Huang, C. W., Wang, Y. L., & Yang, T. R. (2006). Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. 於 ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings (頁 981-984). 文章 4266768 (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE). https://doi.org/10.1109/SMELEC.2006.380785

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. / Feng, Zhe Chuan; Cheng, Li Chi; Huang, Chu Wan 等.
ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings. 2006. p. 981-984 4266768 (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE).

研究成果: 書貢獻/報告類型 › 會議論文篇章

Feng, ZC, Cheng, LC, Huang, CW, Wang, YL & Yang, TR 2006, Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. 於 ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings., 4266768, IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE, 頁 981-984, 2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006, Kuala Lumpur, 马来西亚, 2006/11/29. https://doi.org/10.1109/SMELEC.2006.380785

Feng ZC, Cheng LC, Huang CW, Wang YL, Yang TR. Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. 於 ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings. 2006. p. 981-984. 4266768. (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE). doi: 10.1109/SMELEC.2006.380785

Feng, Zhe Chuan ; Cheng, Li Chi ; Huang, Chu Wan 等. / Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings. 2006. 頁 981-984 (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE).

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abstract = "Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy techniques have been employed for the investigation on Si-based layer structures for sub-micron Si-IC Applications. The high energy synchrotron radiation light sources have produced plenty of X-ray lines with high index diffraction and strong X-ray photoelectron emissions. The useful information will increase our understanding of these materials which are applied extensively to the semiconductor industry.",

author = "Feng, \{Zhe Chuan\} and Cheng, \{Li Chi\} and Huang, \{Chu Wan\} and Wang, \{Ying Lang\} and Yang, \{T. R.\}",

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Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

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出版系列

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ASJC Scopus subject areas

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