Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications

Zhe Chuan Feng, Li Chi Cheng, Chu Wan Huang, Ying Lang Wang, T. R. Yang

研究成果: 書貢獻/報告類型會議貢獻

摘要

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy techniques have been employed for the investigation on Si-based layer structures for sub-micron Si-IC Applications. The high energy synchrotron radiation light sources have produced plenty of X-ray lines with high index diffraction and strong X-ray photoelectron emissions. The useful information will increase our understanding of these materials which are applied extensively to the semiconductor industry.

原文英語
主出版物標題ICSE 2006
主出版物子標題2006 IEEE International Conference on Semiconductor Electronics, Proceedings
頁面981-984
頁數4
DOIs
出版狀態已發佈 - 2006 十二月 1
事件2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006 - Kuala Lumpur, 马来西亚
持續時間: 2006 十一月 292006 十二月 1

出版系列

名字IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

其他

其他2006 IEEE International Conference on Semiconductor Electronics, ICSE 2006
國家马来西亚
城市Kuala Lumpur
期間06/11/2906/12/1

ASJC Scopus subject areas

  • Engineering(all)

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  • 引用此

    Feng, Z. C., Cheng, L. C., Huang, C. W., Wang, Y. L., & Yang, T. R. (2006). Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy investigation on Si-based structures for sub-micron Si-IC applications. 於 ICSE 2006: 2006 IEEE International Conference on Semiconductor Electronics, Proceedings (頁 981-984). [4266768] (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE). https://doi.org/10.1109/SMELEC.2006.380785