Studying the impact of carbon on device performance for strained-Si MOSFETs

M. H. Lee, S. T. Chang, C. Y. Peng, B. F. Hsieh, S. Maikap, S. H. Liao

研究成果: 雜誌貢獻文章

2 引文 斯高帕斯(Scopus)

摘要

The strained-Si:C long channel MOSFET on a relaxed SiGe buffer is demonstrated in this study. The extracted electron mobility showed an enhancement of ~40% with the incorporation of 0.25% carbon in strained-Si long channel NMOSFETs. However, no improvement was seen in the output characteristics of the strained-Si:C PMOSFET. The performance enhancement seen is less than the theoretical prediction for increasing carbon content; this is due to the high alloy scattering potential with carbon incorporation, high interface state density (Dit) at the oxide/strained-Si:C interface and interstitial carbon induced Coulomb scattering. However, increased amounts of C may result in degraded device performance. Therefore, a balance must be struck to minimize C-induced extra Coulomb and alloy scattering rates in the fabrication of these devices.

原文英語
頁(從 - 到)105-109
頁數5
期刊Thin Solid Films
517
發行號1
DOIs
出版狀態已發佈 - 2008 十一月 3

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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  • 引用此

    Lee, M. H., Chang, S. T., Peng, C. Y., Hsieh, B. F., Maikap, S., & Liao, S. H. (2008). Studying the impact of carbon on device performance for strained-Si MOSFETs. Thin Solid Films, 517(1), 105-109. https://doi.org/10.1016/j.tsf.2008.08.087