Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography

Yung Lang Yang, Chin Chi Hsu, Tien Li Chang, Long Sheng Kuo, Ping Hei Chen*

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

64 引文 斯高帕斯(Scopus)

摘要

This study presents the wetting properties, including hydrophilicity, hydrophobicity and anisotropic behavior, of water droplets on the silicon wafer surface with periodical nanopatterns and hierarchical structures. This study fabricates one- and two-dimensional periodical nanopatterns using laser interference lithography (LIL). The fabrication of hierarchical structures was effectively achieved by combining photolithography and LIL techniques. Unlike conventional fabrication methods, the LIL technique is mainly used to control the large-area design of periodical nanopatterns in this study. The minimum feature size for each nanopattern is 100 nm. This study shows that the wetting behavior of one-dimensional, two-dimensional, and hierarchical patterns can be obtained, benefiting the development of surface engineering for microfluidic systems.

原文英語
頁(從 - 到)3683-3687
頁數5
期刊Applied Surface Science
256
發行號11
DOIs
出版狀態已發佈 - 2010 3月 15
對外發佈

ASJC Scopus subject areas

  • 一般化學
  • 凝聚態物理學
  • 一般物理與天文學
  • 表面和介面
  • 表面、塗料和薄膜

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