PMMA (polymethyl methacrylate) has been widely used as x-ray LIGA material for its good features of electrical acid plating of all common metals to industrial applications. Unlike the tough characteristics of polyimide in almost all alkaline and acid solutions, PMMA is easily removed in chemical etchants after electroplating process. For this reason, ablation-etching characteristics of PMMA material for 3D microstructures fabrication using a 248nm KrF excimer laser were investigated. Moreover, the uses of the laminated dry film were also studied in this work. Experimental results show that PMMA microstructress can produce the near-vertical side-wall profile as the laser fluence up to 2.5 J/cm2. PMMA templates with high aspect ratio of around 25 were demonstrated, and the sequential electroplating processes have realized the metallic microstructures. Moreover, the microstructures fabricated in dry film show the perfect side-wall quality, and no residues of debris were found.
|頁（從 - 到）||342-348|
|期刊||Proceedings of SPIE - The International Society for Optical Engineering|
|出版狀態||已發佈 - 1998 十二月 1|
|事件||Micromachining and Microfabrication Process Technology IV - Santa Clara, CA, 美国|
持續時間: 1998 九月 21 → 1998 九月 22
ASJC Scopus subject areas