Structures and magnetic properties for electrodeposited Co ultrathin films on copper

T. Mangen, H. S. Bai, Jyh-Shen Tsay*


研究成果: 雜誌貢獻期刊論文同行評審

13 引文 斯高帕斯(Scopus)


The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by employing cyclic voltammetry (CV), atomic force microscopy, and in-situ magneto-optic Kerr effect (MOKE) techniques. By comparing CV measurements in the pure supporting electrolyte (11 mM K2SO4/1 mM H2SO4) and the cobalt sulphate solution (10 mM K2SO4/1 mM H2SO4/1 mM CoSO4), peaks from voltammetric cycling for copper dissolution, readsorption of dissolved copper ions, cobalt bulk dissolution and oxidation of hydrogen could be resolved. As the electroplating time increases, the size of the Co clusters increases and the deposition of Co corresponds to island growth. The first hysteresis loop occurs at a Co thickness of 0.33 nm in the longitudinal configuration. For films thinner than 7 nm, the Kerr intensity increases linearly because the Curie temperature of the film is well above 300 K.

頁(從 - 到)1863-1867
期刊Journal of Magnetism and Magnetic Materials
出版狀態已發佈 - 2010 七月

ASJC Scopus subject areas

  • 電子、光磁材料
  • 凝聚態物理學


深入研究「Structures and magnetic properties for electrodeposited Co ultrathin films on copper」主題。共同形成了獨特的指紋。