Structural properties of ultra-thin Y2O3 gate dielectrics studied by X-Ray Diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS)

Chuan Hsi Liu, Pi Chun Juan, Chin Pao Cheng, Guan Ting Lai, Huan Lee, Yi Kuan Chen, Yu Wei Liu, Chih Wei Hsu

研究成果: 書貢獻/報告類型 › 會議貢獻

2 引文 斯高帕斯（Scopus）

指紋 深入研究「Structural properties of ultra-thin Y<sub>2</sub>O<sub>3</sub> gate dielectrics studied by X-Ray Diffraction (XRD) and X-Ray Photoelectron Spectroscopy (XPS)」主題。共同形成了獨特的指紋。

Engineering & Materials Science