Structural Evolution and Stability of RF Sputter Deposited Li xMn2-yO4 Thin Film Cathodes

K. F. Chiu*, H. H. Hsiao, G. S. Chen, H. L. Liu, J. L. Her, H. C. Lin


研究成果: 雜誌貢獻期刊論文同行評審

30 引文 斯高帕斯(Scopus)


Thin films of LixMn2-yO4 compounds were deposited by radio frequency (rf) magnetron sputtering from a sintered LiMn 2O4 target on Si substrate under working pressures of 0.4 Pa and 2 Pa (pure Ar gas). In situ substrate heating was applied to modify the film crystallography. The films deposited at a pressure of 2 Pa with substrate heating developed a (111) texture with increase of substrate temperature. To compare the structural stability of deposited films, rapid thermal anneal (RTA) of 300 - 700°C was performed. Films deposited under different conditions exhibited different trends of structural evolution, as treated by RTA. The crystal structure evolution of films deposited under different conditions was studied by X-ray diffraction and micro-Raman spectroscopy. The films deposited at elevated temperature retained the cubic spinel structure after RTA treatment of 700°C, while the films deposited without substrate heating showed significant cationic disorder after RTA. The discharge curves of the half-cells made of LixMn2-yO4 thin films were measured. It was demonstrated that the films deposited with in situ substrate heating exhibited larger capacity compared with other films. The more stable spinel phase on the films deposited with in situ heating may be responsible for the enhanced capacity.

頁(從 - 到)A452-A455
期刊Journal of the Electrochemical Society
出版狀態已發佈 - 2004

ASJC Scopus subject areas

  • 電子、光磁材料
  • 可再生能源、永續發展與環境
  • 表面、塗料和薄膜
  • 電化學
  • 材料化學


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