摘要
In this study, we investigate the impact of orientated crystalline InGaZnO (IGZO) thin film transistor. To evaluate interface thermodynamic stability of temperature-sensitive IGZO film, the film-structural stabilities of high- and low-indium-content InGaZnO were studied. With increasing annealing temperature up to 700 °C, the crystallinity becomes more pronounced while device electrical characteristics are further improved. We find that the apparently reduced off-state current can be attributed to the formation of c-axis-orientated crystalline located at the X-ray diffraction peak of (0, 0, 16). The performance improvements include a very low turn-on voltage close to zero voltage, a small subthreshold swing of 130mV/dec, and a low off-state current of 2.4 × 10-14A/μm at a low operating voltage of 4V.
原文 | 英語 |
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文章編號 | 04DF05 |
期刊 | Japanese Journal of Applied Physics |
卷 | 54 |
發行號 | 4 |
DOIs | |
出版狀態 | 已發佈 - 2015 4月 1 |
ASJC Scopus subject areas
- 一般工程
- 一般物理與天文學