摘要
Liquid phase deposition method was used to deposit SiO2 dots on the Si cap layers of self-assembled Ge dots. The step height and base width of the dots increased with the deposition time. A metal-oxide-semiconductor photodetector with a responsivity of 0.08 mA/W at 1550 nm was also fabricated.
原文 | 英語 |
---|---|
頁(從 - 到) | 589-591 |
頁數 | 3 |
期刊 | Applied Physics Letters |
卷 | 82 |
發行號 | 4 |
DOIs | |
出版狀態 | 已發佈 - 2003 1月 27 |
對外發佈 | 是 |
ASJC Scopus subject areas
- 物理與天文學(雜項)