摘要
The antiferroelectricity in HfZrO2 (HZO) annealed at 600°C with an abrupt turn ON of FET characteristics with SSmin=23 mV/dec and SS avg=50 mV/dec over 4 decades of IDS is demonstrated. The near non-hysteresis is achieved with an antiferroelectric-like HZO due to a small remanent polarization and a coercive field. A feasible concept of coupling the antiferroelectric and ferroelectric type HZO are used for low-power electronics and the memory applications, respectively.
| 原文 | 英語 |
|---|---|
| 文章編號 | 7038127 |
| 頁(從 - 到) | 294-296 |
| 頁數 | 3 |
| 期刊 | IEEE Electron Device Letters |
| 卷 | 36 |
| 發行號 | 4 |
| DOIs | |
| 出版狀態 | 已發佈 - 2015 4月 1 |
ASJC Scopus subject areas
- 電子、光磁材料
- 電氣與電子工程
指紋
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