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Steep Slope and Near Non-Hysteresis of FETs with Antiferroelectric-Like HfZrO for Low-Power Electronics

  • M. H. Lee
  • , Y. T. Wei
  • , K. Y. Chu
  • , J. J. Huang
  • , C. W. Chen
  • , C. C. Cheng
  • , M. J. Chen
  • , H. Y. Lee
  • , Y. S. Chen
  • , L. H. Lee
  • , M. J. Tsai

研究成果: 雜誌貢獻期刊論文同行評審

145   !!Link opens in a new tab 引文 斯高帕斯(Scopus)

摘要

The antiferroelectricity in HfZrO2 (HZO) annealed at 600°C with an abrupt turn ON of FET characteristics with SSmin=23 mV/dec and SS avg=50 mV/dec over 4 decades of IDS is demonstrated. The near non-hysteresis is achieved with an antiferroelectric-like HZO due to a small remanent polarization and a coercive field. A feasible concept of coupling the antiferroelectric and ferroelectric type HZO are used for low-power electronics and the memory applications, respectively.

原文英語
文章編號7038127
頁(從 - 到)294-296
頁數3
期刊IEEE Electron Device Letters
36
發行號4
DOIs
出版狀態已發佈 - 2015 4月 1

ASJC Scopus subject areas

  • 電子、光磁材料
  • 電氣與電子工程

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