TY - JOUR
T1 - Sputter-cleaning of an aluminum alloy using a thermionically assisted triode plasma system
AU - Hsieh, J. H.
AU - Li, C.
AU - Liu, S. J.
PY - 2013/9/16
Y1 - 2013/9/16
N2 - Polished aluminum alloy (6061) samples were cleaned using Ar plasma in a diode or triode plasma system. By monitoring cathode current, the changes of surface state and removal (cleaning) rate were determined and compared based on various setup. A modified mathematical model, based on Berg's reactive sputtering model, is derived and proposed to simulate the cleaning process. The results show that it is possible to sputter-clean the substrate under a triode setup with low bias and high ion bombardment rate (i.e. -500 V, triode, 1.3 Pa). This triode cleaning process was comparable with high bias and high working pressure diode process (i.e. -2500 V, diode, 3.3 Pa). Cleaning with high energy particle bombardment can create rough surface in nano-scale, although with the similar efficiency. Also, according to the regressive fitting on the cathode current-time curve, it is found that the average secondary electron yield for the oxide compound is around 0.33 if the average secondary electron yield for aluminum metal is 0.1.
AB - Polished aluminum alloy (6061) samples were cleaned using Ar plasma in a diode or triode plasma system. By monitoring cathode current, the changes of surface state and removal (cleaning) rate were determined and compared based on various setup. A modified mathematical model, based on Berg's reactive sputtering model, is derived and proposed to simulate the cleaning process. The results show that it is possible to sputter-clean the substrate under a triode setup with low bias and high ion bombardment rate (i.e. -500 V, triode, 1.3 Pa). This triode cleaning process was comparable with high bias and high working pressure diode process (i.e. -2500 V, diode, 3.3 Pa). Cleaning with high energy particle bombardment can create rough surface in nano-scale, although with the similar efficiency. Also, according to the regressive fitting on the cathode current-time curve, it is found that the average secondary electron yield for the oxide compound is around 0.33 if the average secondary electron yield for aluminum metal is 0.1.
KW - Glow discharge
KW - Oxides
KW - Sputtering
KW - Surfaces
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U2 - 10.1016/j.matchemphys.2013.06.016
DO - 10.1016/j.matchemphys.2013.06.016
M3 - Article
AN - SCOPUS:84881137206
SN - 0254-0584
VL - 141
SP - 869
EP - 873
JO - Materials Chemistry and Physics
JF - Materials Chemistry and Physics
IS - 2-3
ER -