摘要
The contribution of gate materials to the photoresponse of thin-film field-effect photodetectors has long been overlooked, with prior studies focusing primarily on photoconductive and photogating effects within the sensing layer. Here, we show that under weak illumination, photocarriers primarily originate from the silicon gate rather than the MoS2 channel. Absorption spectra confirm that light is mainly absorbed by the gate, driving a negative photocurrent (NPC). The NPC magnitude and slope vary with illumination intensity and VDS, suggesting transport dominated by Si/SiO2 interface traps. NPC persists when MoS2 is replaced with Au/Ti, reinforcing the gate-driven mechanism. At higher powers, band bending reverses due to competing photovoltaic and trap-induced potentials. These results highlight the active role of the gate and offer strategies for device optimization.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 8266-8274 |
| 頁數 | 9 |
| 期刊 | ACS Nano |
| 卷 | 20 |
| 發行號 | 10 |
| DOIs | |
| 出版狀態 | 已發佈 - 2026 3月 17 |
UN SDG
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ASJC Scopus subject areas
- 一般材料科學
- 一般工程
- 一般物理與天文學
指紋
深入研究「Revealing the Active Role of the Gate Electrode in Weak-Light Detection」主題。共同形成了獨特的指紋。引用此
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