@article{ffb6fdad75ae41db81fae53129b21591,
title = "Remote inductive effects in the Si 2p spectra of halogenated silicon",
abstract = "Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.",
keywords = "Halogens, Low index single crystal surfaces, Photoelectron emission, Silicon, Soft X-ray photoelectron spectroscopy",
author = "Simpson, {W. C.} and Yarmoff, {J. A.} and Hung, {W. H.} and McFeely, {F. R.}",
note = "Funding Information: This work was supportedb y the Director, office of Energy Researcho, fficeof Basic Energy SciencesM, aterialsS ciencesD ivision of the US Departmento f Energy under Contract No. DE-AC03-76SF00098D.a ta were collecteda t the National SynchrotronLi ght Source,B rookhaven National Laboratoryw, hich is supportedb y the Departmento f Energy (Division of Materials Sciencesa ndDivision of ChemicaSl ciencesB, asic Energy Sciencesu) nderC ontractN o. DE-AC02-76CH0001 6.",
year = "1996",
month = jun,
day = "1",
doi = "10.1016/0039-6028(96)00517-1",
language = "English",
volume = "355",
pages = "L283--L288",
journal = "Surface Science",
issn = "0039-6028",
publisher = "Elsevier BV",
number = "1-3",
}