Remote inductive effects in the Si 2p spectra of halogenated silicon

W. C. Simpson, J. A. Yarmoff, W. H. Hung, F. R. McFeely

研究成果: 雜誌貢獻文章同行評審

3 引文 斯高帕斯(Scopus)

摘要

Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.

原文英語
頁(從 - 到)L283-L288
期刊Surface Science
355
發行號1-3
DOIs
出版狀態已發佈 - 1996 六月 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

指紋 深入研究「Remote inductive effects in the Si 2p spectra of halogenated silicon」主題。共同形成了獨特的指紋。

引用此