Remote inductive effects in the Si 2p spectra of halogenated silicon

W. C. Simpson, J. A. Yarmoff*, W. H. Hung, F. R. McFeely

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

3 引文 斯高帕斯(Scopus)

摘要

Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.

原文英語
頁(從 - 到)L283-L288
期刊Surface Science
355
發行號1-3
DOIs
出版狀態已發佈 - 1996 六月 1

ASJC Scopus subject areas

  • 凝聚態物理學
  • 表面和介面
  • 表面、塗料和薄膜
  • 材料化學

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