Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

M. J. Twu, A. H. Chiou, C. C. Hu, C. Y. Hsu*, C. G. Kuo

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

24 引文 斯高帕斯(Scopus)

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Physics & Astronomy

Engineering & Materials Science

Chemical Compounds