摘要
Polyimide (PI) dielectric as a heatproof material is commonly employed in the integrated circuit (IC) industry. In the dicing saw assembly process, de-ionized (D.I.) water which has a higher resistance is rubbed on PI material. Hence, negative electrostatic charges are generated and accumulated on gate oxide capacitor or p-n junction capacitor in each IC chip. Since the discharge path is isolated during this time, sufficient cumulated charges through some feasible electrical path will damage the IC devices in this process step. Such damaged ICs exhibit function failure. A CO2 gas flow under 2-3 kgw/cm2 gas pressure to form a weak carbonic acid in water is efficient to conduct out the accumulated charges and adequately prevent the charge damage on IC devices. The final-test yield in sub-micron analog power complementary metal-oxide-semiconductor (CMOS) ICs was impressively increased from 80% to 98%.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 839-846 |
| 頁數 | 8 |
| 期刊 | Microelectronics Reliability |
| 卷 | 50 |
| 發行號 | 6 |
| DOIs | |
| 出版狀態 | 已發佈 - 2010 6月 |
ASJC Scopus subject areas
- 電子、光磁材料
- 原子與分子物理與光學
- 安全、風險、可靠性和品質
- 凝聚態物理學
- 表面、塗料和薄膜
- 電氣與電子工程
指紋
深入研究「Promoting of charged-device model/electrostatic discharge immunity in the dicing saw process」主題。共同形成了獨特的指紋。引用此
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