PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang; Chii Rong Yang; Chun Ming Chang; Chun Ting Lin; Yu Hsiang Tang; Ming Hua Shiao; Yuang Cherng Chiou; Rong Tsong Lee

doi:10.1016/j.mee.2011.02.028

PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang^*, Chii Rong Yang, Chun Ming Chang, Chun Ting Lin, Yu Hsiang Tang, Ming Hua Shiao, Yuang Cherng Chiou, Rong Tsong Lee

^*此作品的通信作者

機電工程學系

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

5 引文斯高帕斯（Scopus）

摘要

This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

原文	英語
頁（從 - 到）	2576-2579
頁數	4
期刊	Microelectronic Engineering
卷	88
發行號	8
DOIs	https://doi.org/10.1016/j.mee.2011.02.028
出版狀態	已發佈 - 2011 8月

ASJC Scopus subject areas

電子、光磁材料
原子與分子物理與光學
凝聚態物理學
表面、塗料和薄膜
電氣與電子工程

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10.1016/j.mee.2011.02.028

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title = "PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique",

abstract = "This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.",

keywords = "Catalytic etching, Nano-column, Nano-molding, SANL",

author = "Huang, {Mao Jung} and Yang, {Chii Rong} and Chang, {Chun Ming} and Lin, {Chun Ting} and Tang, {Yu Hsiang} and Shiao, {Ming Hua} and Chiou, {Yuang Cherng} and Lee, {Rong Tsong}",

year = "2011",

month = aug,

doi = "10.1016/j.mee.2011.02.028",

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AU - Huang, Mao Jung

AU - Yang, Chii Rong

AU - Chang, Chun Ming

AU - Lin, Chun Ting

AU - Tang, Yu Hsiang

AU - Shiao, Ming Hua

AU - Chiou, Yuang Cherng

AU - Lee, Rong Tsong

PY - 2011/8

Y1 - 2011/8

N2 - This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

AB - This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

KW - Catalytic etching

KW - Nano-column

KW - Nano-molding

KW - SANL

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VL - 88

SP - 2576

EP - 2579

JO - Microelectronic Engineering

JF - Microelectronic Engineering

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ER -

PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

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ASJC Scopus subject areas

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