PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang, Chii Rong Yang, Chun Ming Chang, Chun Ting Lin, Yu Hsiang Tang, Ming Hua Shiao, Yuang Cherng Chiou, Rong Tsong Lee

研究成果: 雜誌貢獻期刊論文同行評審

5 引文 斯高帕斯(Scopus)

摘要

This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

原文英語
頁(從 - 到)2576-2579
頁數4
期刊Microelectronic Engineering
88
發行號8
DOIs
出版狀態已發佈 - 2011 八月

ASJC Scopus subject areas

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 表面、塗料和薄膜
  • 電氣與電子工程

指紋

深入研究「PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique」主題。共同形成了獨特的指紋。

引用此