Plasma-induced magnetic patterning of FePd thin films without and with exchange bias

Wei Hsiang Wang, Po Chun Chang, Pei hsun Jiang*, Wen-Chin Lin

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

摘要

We demonstrate control of magnetic domain structures in continuous FePd thin films by patterning their surfaces with plasma treatment. The Fe-oxide layer formed on the surface upon ambient exposure of the FePd alloy thin film grown on an Al2O3(0001) substrate was patterned into microstructures by e-beam lithography followed by O2- or Ar-plasma treatment. Microscopic pinning of magnetic domain walls in the thin films is then observed by magneto-optic Kerr effect microscopy, with the magnetic field needed to reverse the magnetization of the plasma-treated areas being larger than that for the untreated areas. An intriguing competition between the uniaxial anisotropy and the exchange bias is also observed in the system. This study demonstrates that patterning of the film surface with plasma treatment can be an easy and efficient method for sophisticated engineering of magnetic structures in thin films, and therefore has potential application in developing future data-storage and spintronic devices.

原文英語
文章編號146831
期刊Applied Surface Science
527
DOIs
出版狀態已發佈 - 2020 十月 15

ASJC Scopus subject areas

  • 化學 (全部)
  • 凝聚態物理學
  • 物理與天文學 (全部)
  • 表面和介面
  • 表面、塗料和薄膜

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