Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

Cheng Chung Jaing*, Chii Rong Yang, Chun Ming Chang, Chao Te Lee, Chien Nan Hsiao

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)

摘要

Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 μm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of (90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

原文英語
文章編號033009
期刊Journal of Micro/Nanolithography, MEMS, and MOEMS
8
發行號3
DOIs
出版狀態已發佈 - 2009

ASJC Scopus subject areas

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 凝聚態物理學
  • 機械工業
  • 電氣與電子工程

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