Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

Cheng Chung Jaing, Chii Rong Yang, Chun Ming Chang, Chao Te Lee, Chien Nan Hsiao

研究成果: 雜誌貢獻文章

2 引文 斯高帕斯(Scopus)

摘要

Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 μm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of (90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

原文英語
文章編號033009
期刊Journal of Micro/Nanolithography, MEMS, and MOEMS
8
發行號3
DOIs
出版狀態已發佈 - 2009 一月 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

指紋 深入研究「Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography」主題。共同形成了獨特的指紋。

  • 引用此