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Optimization of Defects in Monolayer MoS2 via Femtosecond Laser Annealing

研究成果: 書貢獻/報告類型會議論文篇章

1   連結會在新分頁中打開 引文 斯高帕斯(Scopus)

摘要

In recent years, two-dimensional materials have emerged as a hot research area for semiconductor development and related technologies, paving the way for new directions and possibilities. Among these materials, transition metal dichalcogenides (TMDs) are particularly promising candidates for integrated circuits due to their highly suitable band gap sizes, especially in the context of field-effect transistors (FETs). In the realm of TMDs, molybdenum disulfide (MoS2) and tungsten diselenide (WSe2) have become potential channel materials. However, challenges such as damage, crystallization defects, and imaging issues during the preparation of 2D materials can lead to issues like poor conductivity, inadequate luminescence, instability, and leakage currents. To tackle these challenges, this study focuses on monolayer MoS2 among 2D materials, employing femtosecond laser pulse annealing to rapidly anneal crystals that are defective or damaged. This technique aims to optimize the crystal structure by addressing any defects that may arise during the growth process. Photoluminescence (PL) and Raman spectroscopy serve as detection systems in this research, used to examine the changes in 2D materials before and after annealing, providing valuable insights into their quality and structural integrity. This novel femtosecond pulse annealing technique greatly aids in the fabrication of 3D integrated circuits, as many materials used in 3D IC are two-dimensional. By replacing traditional thermal annealing techniques with femtosecond laser pulse annealing, this method not only eliminates the thermal effects and time-consuming nature associated with conventional annealing, but also harnesses concentrated pulsed laser to achieve rapid thermal processing. This approach effectively suppresses surface defects and enhances characteristics such as conductivity, luminescence, and stability, making it a powerful advancement in next-generation semiconductor technology.

原文英語
主出版物標題Nanoscale and Quantum Materials
主出版物子標題From Synthesis and Laser Processing to Applications 2025
編輯Andrei V. Kabashin, Maria Farsari, Masoud Mahjouri-Samani
發行者SPIE
ISBN(電子)9781510684522
DOIs
出版狀態已發佈 - 2025
事件Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2025 - San Francisco, 美国
持續時間: 2025 1月 252025 1月 27

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
13352
ISSN(列印)0277-786X
ISSN(電子)1996-756X

會議

會議Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2025
國家/地區美国
城市San Francisco
期間2025/01/252025/01/27

UN SDG

此研究成果有助於以下永續發展目標

  1. SDG 3 - 健康與福祉
    SDG 3 健康與福祉

ASJC Scopus subject areas

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

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