@article{64f6bcc6bd9b407ba8c7bfdc1c62f0a9,
title = "On-Chip HBM and HMM ESD Protection Design for RF Applications in 40-nm CMOS Process",
abstract = "On-chip electrostatic discharge (ESD) protection device with large dimension can sustain high-ESD current, but the parasitic capacitance of the ESD protection device will increase the difficulty of impedance matching and degrade the bandwidth for broadband radio frequency (RF) applications. The traditional distributed ESD protection circuit can achieve good impedance matching, but it has a worse ESD robustness because of larger resistance caused by the input inductor. In this paper, a new distributed ESD protection structure with the stacked diodes with embedded silicon-controlled rectifier is proposed to attain good ESD robustness without degrading the RF performance. The proposed ESD protection circuit has been successfully verified in a 40-nm, 2.5-V CMOS process to sustain a human-metal model of 5 kV. The proposed ESD protection circuit is suitable to protect the broadband RF circuits in advanced nanoscale CMOS technology.",
keywords = "Distributed electrostatic discharge (ESD) protection, ESD, radio frequency (RF), silicon-controlled rectifier (SCR)",
author = "Chen, {Jie Ting} and Lin, {Chun Yu} and Chang, {Rong Kun} and Ker, {Ming Dou}",
note = "Funding Information: Manuscript received May 31, 2018; revised September 11, 2018; accepted September 25, 2018. Date of publication October 22, 2018; date of current version November 26, 2018. This work was supported in part by Novatek Microelectronics Corporation, Taiwan, and in part by the Ministry of Science and Technology, Taiwan, under Contract MOST 107-2622-8-009-006-TE1. The review of this paper was arranged by Editor E. Rosenbaum. (Corresponding author: Ming-Dou Ker.) J.-T. Chen, R.-K. Chang, and M.-D. Ker are with the Institute of Electronics, National Chiao Tung University, Hsinchu 300, Taiwan (e-mail: mdker@ieee.org). Publisher Copyright: {\textcopyright} 2018 IEEE.",
year = "2018",
month = dec,
doi = "10.1109/TED.2018.2873768",
language = "English",
volume = "65",
pages = "5267--5274",
journal = "IEEE Transactions on Electron Devices",
issn = "0018-9383",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "12",
}