摘要
The advantage of a nonlinear bidirectional selector is its high access ratio with multiple transport mechanisms in a wide bias range. The multilayer structure of TiN/Al2O3/TiO2/Al 2O3/Ti with a nonlinear varistor characteristic is proposed. The features of the structure include its low-temperature process (~250°C) for stackable applications, non-requirement of rare materials such as Pt, and its high access ratio (~3200). The varistor characteristic of the nonlinear selector is discussed and attributed to carrier tunneling and thermionic emission for small biases (OFF state) and large biases (ON state), respectively. The selector shows scaling feasibility owing to its property of inertness to SiO2 encapsulation and is compatible with the current IC and memory industry.
原文 | 英語 |
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文章編號 | 08LE03 |
期刊 | Japanese Journal of Applied Physics |
卷 | 53 |
發行號 | 8 SPEC. ISSUE 1 |
DOIs | |
出版狀態 | 已發佈 - 2014 8月 |
ASJC Scopus subject areas
- 一般工程
- 一般物理與天文學