New mechanism for gate oxide degradation and its applications

Chuan H. Liu, K. Y. Fu, Thomas A. DeMassa, Julian J. Sanchez

研究成果: 會議貢獻類型會議論文同行評審

指紋 深入研究「New mechanism for gate oxide degradation and its applications」主題。共同形成了獨特的指紋。

Engineering & Materials Science