Nanotribological properties of ALD-processed bilayer TiO2/ZnO films

Wun Kai Wang, Hua Chiang Wen, Chun Hu Cheng, Ching Hua Hung, Wu Ching Chou, Wei Hung Yau*, Ping Feng Yang, Yi Shao Lai

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

6 引文 斯高帕斯(Scopus)

摘要

TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2. With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300°C, and 36 μN for 400°C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400°C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading.

原文英語
頁(從 - 到)2754-2759
頁數6
期刊Microelectronics Reliability
54
發行號12
DOIs
出版狀態已發佈 - 2014 十二月 1

ASJC Scopus subject areas

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 安全、風險、可靠性和品質
  • 凝聚態物理學
  • 表面、塗料和薄膜
  • 電氣與電子工程

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