Nanotribological behavior of ZnO films prepared by atomic layer deposition

Wun Kai Wang, Hua Chiang Wen, Chun Hu Cheng, Wu Ching Chou, Wei Hung Yau*, Ching Hua Hung, Chang Pin Chou

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

4 引文 斯高帕斯(Scopus)

摘要

We used atomic layer deposition to form ZnO thin-film coatings on Si substrates and then evaluate the effect of pile-up using the nanoscratch technique under a ramped mode. The wear volume decreased with increasing annealing temperature from room temperature to 400 C for a given load. Elastic-to-plastic deformation occurred during sliding scratch processing between the groove and film for loading penetration of 30 nm. The onset of non-elastic behavior and greater contact pressure were evident for loading penetration of 150 nm; thus, full plastic deformation occurred as a result of a substrate effect. We suspect that elastic-plastic failure events were related to edge bulging between the groove and film, with elastic-plastic deformation attributable to adhesion discontinuities and/or cohesion failure of the ZnO films.

原文英語
頁(從 - 到)334-338
頁數5
期刊Journal of Physics and Chemistry of Solids
75
發行號3
DOIs
出版狀態已發佈 - 2014 三月

ASJC Scopus subject areas

  • 化學 (全部)
  • 材料科學(全部)
  • 凝聚態物理學

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