Nanoscale potential fluctuation in non-stoichiometric HfOx and low resistive transport in RRAM

V. N. Kruchinin, V. Sh Aliev, T. V. Perevalov, D. R. Islamov, V. A. Gritsenko*, I. P. Prosvirin, C. H. Cheng, A. Chin

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

23 引文 斯高帕斯(Scopus)

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INIS

Material Science