摘要
A nanoelectronic device consisting of a Si Nx SiSi Nx nanopillar and a side electrical gate has been assembled to display single-electron resonance tunneling and Coulomb modulation at 300 K. The device features an ultrasmall quantum dot of size ∼10×10×3 nm3 and its manufacture is fully silicon processing compatible. We find a simple guideline to derive the gate-dot coupling strength α by comparison of the peak spacing in the current-voltage (I-V) characteristics of Id - Vd and Id - Vg at low voltage. The better-defined quantum cavity enables us to apply a three-dimensional single-particle model to identify the excited quantum states.
| 原文 | 英語 |
|---|---|
| 文章編號 | 123506 |
| 頁(從 - 到) | 1-3 |
| 頁數 | 3 |
| 期刊 | Applied Physics Letters |
| 卷 | 87 |
| 發行號 | 12 |
| DOIs | |
| 出版狀態 | 已發佈 - 2005 9月 19 |
| 對外發佈 | 是 |
ASJC Scopus subject areas
- 物理與天文學(雜項)
指紋
深入研究「Nanopillar transistors exhibiting single-electron quantum effects at room temperature」主題。共同形成了獨特的指紋。引用此
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