摘要
We report a novel resistive random access memory using tri-layer dielectrics of GeO x /nano-crystal TiO2/TaON and low cost top Ni and bottom TaN electrodes. Excellent device performance of ultra-low 720 fJ switching energy, tight distributions of set/reset currents, and exceptionally long endurance of 5×109 cycles were achieved simultaneously. Such excellent endurance may create new applications such as those used for Data Centers that are ascribed to the higher-κ nano-crystal TiO2, hopping pass via grain boundaries, and fast switching speed of 100 ns to improve the dielectric fatigue during endurance stress.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 203-207 |
| 頁數 | 5 |
| 期刊 | Applied Physics A: Materials Science and Processing |
| 卷 | 111 |
| 發行號 | 1 |
| DOIs | |
| 出版狀態 | 已發佈 - 2013 4月 |
ASJC Scopus subject areas
- 一般化學
- 一般材料科學
指紋
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