Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies

Cheng Chung Jaing, Chii-Rong Yang, Chun Ming Chang, Yung Hsin Chang, Chao Te Lee, Chine Nan Hsiao

研究成果: 書貢獻/報告類型會議貢獻

摘要

The Ni films replacing photoresist serve as a mask to selectively deposit optical thin films at a substrate temperature of 300°C by an electron-beam gun evaporation. The photolithograph is used to define the growth of Ni films by an electroforming technique. Mosaic patterns with a width of 20μm are chosen as an arrangement of red color filters. The red filters are formed of alternate SiO2 and TiO2 layers and the average transmittance of red filters is larger than 90%. The experimental results successfully illustrate that the combinative uses of photolithography, electroforming and electron-beam gun evaporation can make miniaturized multilayer dielectric coatings with high light transmittance in a hot deposition.

原文英語
主出版物標題Advances in Thin-Film Coatings for Optical Applications V
DOIs
出版狀態已發佈 - 2008 十二月 19
事件Advances in Thin-Film Coatings for Optical Applications V - San Diego, CA, 美国
持續時間: 2008 八月 112008 八月 11

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
7067
ISSN(列印)0277-786X

其他

其他Advances in Thin-Film Coatings for Optical Applications V
國家美国
城市San Diego, CA
期間08/8/1108/8/11

    指紋

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

引用此

Jaing, C. C., Yang, C-R., Chang, C. M., Chang, Y. H., Lee, C. T., & Hsiao, C. N. (2008). Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies. 於 Advances in Thin-Film Coatings for Optical Applications V [70670P] (Proceedings of SPIE - The International Society for Optical Engineering; 卷 7067). https://doi.org/10.1117/12.801626