Mechanism of threshold voltage shift (Δ Vth) caused by negative bias temperature instability (NBTI) in deep submicron pMOSFETs
Chuan Hsi Liu*, Ming T. Lee, Chih Yung Lin, Jenkon Chen, Y. T. Loh, Fu Tai Liou, Klaus Schruefer, Anastasios A. Katsetos, Zhijian Yang, Nivo Rovedo, Terence B. Hook, Clement Wann, Tze Chiang Chen
*此作品的通信作者
研究成果: 雜誌貢獻 › 期刊論文 › 同行評審
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引文
斯高帕斯(Scopus)