Magnetic properties of ultrathin Co/Si(111) films

Jyh-Shen Tsay, Cheng Shiuh Yang, Yeong Der Yao, Yung Liou, Shang Fan Lee

研究成果: 雜誌貢獻文章

12 引文 斯高帕斯(Scopus)

摘要

The orientation of magnetization and the thickness of the ferromagnetic inactive layer at the interface of Co film and Si substrate in an ultrathin Co/Si(111) film have been studied. At the Si substrate temperature of 120 K, Co films (≤10 monolayers) with in-plane easy axis of magnetization have been successfully prepared. At the Si substrate temperature of 300 K, ultrathin Co films (3.5-10 monolayers) with canted out-of-plane easy axis of magnetization were observed. The ferromagnetic inactive layers were formed at the interface due to the intermixing of Co and Si; and were 2.8 monolayers thick for Co films deposited at 300K. However, their thicknesses were reduced to 1.4 monolayers when deposited at 120 K.

原文英語
頁(從 - 到)5976-5979
頁數4
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
37
發行號11
出版狀態已發佈 - 1998 十一月 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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