Low-pressure organometallic chemical vapor deposition of indium nitride on titanium dioxide nanoparticles

Jeng Han Wang, M. C. Lin

研究成果: 雜誌貢獻文章同行評審

20 引文 斯高帕斯(Scopus)

指紋 深入研究「Low-pressure organometallic chemical vapor deposition of indium nitride on titanium dioxide nanoparticles」主題。共同形成了獨特的指紋。

Chemical Compounds

Physics & Astronomy

Medicine & Life Sciences