Low-pressure organometallic chemical vapor deposition of indium nitride on titanium dioxide nanoparticles

Jeng Han Wang; M. C. Lin

doi:10.1002/cphc.200400137

Low-pressure organometallic chemical vapor deposition of indium nitride on titanium dioxide nanoparticles

Jeng Han Wang, M. C. Lin

化學系

研究成果: 雜誌貢獻 › 文章 › 同行評審

20 引文斯高帕斯（Scopus）

摘要

Saving for a sunny day: The first thin-film deposition and UV/Vis absorption spectrum of InN-coated TiO₂ nanoparticle films is reported. A broad absorption band, which appears in the ≈390-800 nm range (see spectrum) indicates an attractive possibility for solar energy-conversion applications.

原文	英語
頁（從 - 到）	1615-1618
頁數	4
期刊	ChemPhysChem
卷	5
發行號	10
DOIs	https://doi.org/10.1002/cphc.200400137
出版狀態	已發佈 - 2004 十月 18

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry

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10.1002/cphc.200400137

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引用此

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abstract = "Saving for a sunny day: The first thin-film deposition and UV/Vis absorption spectrum of InN-coated TiO2 nanoparticle films is reported. A broad absorption band, which appears in the ≈390-800 nm range (see spectrum) indicates an attractive possibility for solar energy-conversion applications.",

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KW - Sol-gel processes

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KW - Visible absorption

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