摘要
Very high performance Ni/GeOx/HfON/TaN non-volatile resistive memory is fabricated using the covalently bonded dielectric GeOx and metal oxynitride HfON as well as low cost electrodes. The device shows low set and reset powers, good 85 °C retention, and 105 endurance, which are near to the characteristics of existing commercial flash memory.
原文 | 英語 |
---|---|
頁(從 - 到) | 902-905 |
頁數 | 4 |
期刊 | Advanced Materials |
卷 | 23 |
發行號 | 7 |
DOIs | |
出版狀態 | 已發佈 - 2011 2月 15 |
對外發佈 | 是 |
ASJC Scopus subject areas
- 一般材料科學
- 材料力學
- 機械工業