Leakage current improvement of Ni/TiNiO/TaN metal-insulator-metal capacitors using optimized N+ plasma treatment and oxygen annealing

C. C. Huang*, C. H. Cheng, Albert Chin, C. P. Chou

*此作品的通信作者

研究成果: 雜誌貢獻期刊論文同行評審

10 引文 斯高帕斯(Scopus)

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INIS

Physics

Engineering

Material Science