Layout styles to improve CDM ESD robustness of integrated circuits in 65-nm CMOS process

Ming Dou Ker, Chun-Yu Lin, Tang Long Chang

研究成果: 書貢獻/報告類型會議貢獻

5 引文 (Scopus)

摘要

Due to the thinner gate oxide in the nanoscale CMOS technology and the larger chip size in the system-on-chip (SoC) IC products, the charged-device-model (CDM) electrostatic discharge (ESD) has become the major ESD events to cause failures during IC manufacturing procedures. The effective ESD protection design against CDM ESD stresses should be implemented into the chip with layout optimization to improve its ESD robustness. In this work, the impacts of different layout styles of MOS devices on CDM ESD robustness were investigated in a 65-nm CMOS process. The experimental results can provide useful information to optimize the layout of integrated circuits against CDM ESD events.

原文英語
主出版物標題Proceedings of 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011
頁面374-377
頁數4
DOIs
出版狀態已發佈 - 2011 六月 28
事件2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011 - Hsinchu, 臺灣
持續時間: 2011 四月 252011 四月 28

其他

其他2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011
國家臺灣
城市Hsinchu
期間11/4/2511/4/28

指紋

Electrostatic discharge
Integrated circuits
MOS devices
Oxides

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

引用此文

Ker, M. D., Lin, C-Y., & Chang, T. L. (2011). Layout styles to improve CDM ESD robustness of integrated circuits in 65-nm CMOS process. 於 Proceedings of 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011 (頁 374-377). [5783551] https://doi.org/10.1109/VDAT.2011.5783551

Layout styles to improve CDM ESD robustness of integrated circuits in 65-nm CMOS process. / Ker, Ming Dou; Lin, Chun-Yu; Chang, Tang Long.

Proceedings of 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011. 2011. p. 374-377 5783551.

研究成果: 書貢獻/報告類型會議貢獻

Ker, MD, Lin, C-Y & Chang, TL 2011, Layout styles to improve CDM ESD robustness of integrated circuits in 65-nm CMOS process. 於 Proceedings of 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011., 5783551, 頁 374-377, 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011, Hsinchu, 臺灣, 11/4/25. https://doi.org/10.1109/VDAT.2011.5783551
Ker MD, Lin C-Y, Chang TL. Layout styles to improve CDM ESD robustness of integrated circuits in 65-nm CMOS process. 於 Proceedings of 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011. 2011. p. 374-377. 5783551 https://doi.org/10.1109/VDAT.2011.5783551
Ker, Ming Dou ; Lin, Chun-Yu ; Chang, Tang Long. / Layout styles to improve CDM ESD robustness of integrated circuits in 65-nm CMOS process. Proceedings of 2011 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2011. 2011. 頁 374-377
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