TY - JOUR
T1 - Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films
AU - Chou, Ta Hsin
AU - Cheng, Kuei Yuan
AU - Su, Chih Chieh
AU - Chang, Tien Li
AU - Hsieh, Chih Wei
AU - Tsai, Jen Hui
PY - 2010/8
Y1 - 2010/8
N2 - The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.
AB - The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.
KW - Laser interference lithography
KW - Low reflection
KW - Nanoimprint
KW - Transparent conducting oxide
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U2 - 10.1007/s12541-010-0072-6
DO - 10.1007/s12541-010-0072-6
M3 - Article
AN - SCOPUS:78049266390
VL - 11
SP - 619
EP - 622
JO - International Journal of Precision Engineering and Manufacturing
JF - International Journal of Precision Engineering and Manufacturing
SN - 2234-7593
IS - 4
ER -